This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Ryoya Abe - Innovator in Plasma Processing Technology
Introduction
Ryoya Abe is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus.
Latest Patents
Ryoya Abe holds a patent for a plasma processing apparatus. This apparatus comprises a plasma processing chamber, a substrate support, and a baffle structure that surrounds the substrate support. The baffle structure includes an upper baffle plate with multiple first openings, each having a specific width, and a lower baffle plate with several second openings. Additionally, a liner structure surrounds the plasma processing space above the substrate support, featuring both inner and outer cylindrical liners with various openings.
Career Highlights
Ryoya Abe is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies.
Collaborations
Ryoya Abe has collaborated with notable coworkers, including Tetsuji Sato and Shin Matsuura. Their combined expertise has contributed to the success of their projects and innovations.
Conclusion
Ryoya Abe's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing the field. His patent and work at Tokyo Electron Limited highlight his role as a key inventor in this area.