Company Filing History:
1 out of 42,508 
1 out of 3,781 
4 out of 832,880 Years Active: 2002-2004
Title: Ryouichi Furukawa: Innovator in Semiconductor Technology
Introduction
Ryouichi Furukawa is a prominent inventor known for his contributions to semiconductor technology. He is based in Ome, Japan, and holds a total of 6 patents. His work primarily focuses on methods for enhancing the performance and efficiency of semiconductor devices.
Latest Patents
One of Furukawa's latest patents is a method of forming a data-storing capacitive element made in an insulating film on a semiconductor substrate. This innovative approach involves the deposition of an amorphous silicon film in trenches made in a silicon oxide film, followed by the application of a photoresist film. The process includes exposure to light, development of the photoresist film, and dry etching to remove unwanted parts of the amorphous silicon film.
Another significant patent is related to the manufacturing of a semiconductor integrated circuit device that comprises a memory cell and a capacitor. This method utilizes a silicon oxide film formed by the plasma CVD method at temperatures ranging from 450°C to 700°C. The design allows for reduced degassing from the silicon oxide film, which enhances the growth of silicon grains and increases capacitance. Additionally, it eliminates the need for a heat treatment step, thereby preserving the properties of the MISFET.
Career Highlights
Furukawa has worked with notable companies, including Hitachi, Ltd. His experience in the semiconductor industry has significantly influenced the development of advanced technologies in this field.
Collaborations
Throughout his career, Ryouichi Furukawa has collaborated with esteemed colleagues such as Hirohiko Yamamoto and Tadanori Yoshida. Their joint efforts have contributed to the advancement of semiconductor technologies.
Conclusion
Ryouichi Furukawa's innovative work in semiconductor technology has led to several patents that enhance the efficiency and performance of integrated circuits. His contributions continue to impact the field significantly.