Ryotaro Shinohara

Title: Ryotaro Shinohara: Innovator in Substrate Processing Technologies

Introduction

Ryotaro Shinohara is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His work focuses on improving techniques for chemical liquid processing and cleaning processes on substrates.

Latest Patents

Shinohara's latest patents include a substrate processing apparatus and a substrate processing method. The first invention is directed to substrate processing techniques that perform chemical liquid processing or cleaning on a substrate. In this invention, while the substrate is processed with the processing liquid, liquid droplets scattered from the substrate are collected by the inner peripheral surface of a cup. After processing, and before the cup is elevated to a cup elevation position, a heated gas is supplied to the inner peripheral surface of the cup via the upper surface of the substrate while the cup is rotated. This method effectively dries the cup through rotation and the supply of heated gas.

The second patent involves a gas supplier designed to discharge gas into a space between a substrate and a shielding plate. The gas is supplied to a gas discharge nozzle in the shielding plate, creating a flow of gas from the center toward the outer edge of the substrate. The gas supplier is controlled to ensure that the flow velocity of the gas at the peripheral edge of the substrate is greater than zero.

Career Highlights

Ryotaro Shinohara is associated with Screen Holdings Co., Ltd., a company known for its innovations in the semiconductor industry. His work has been instrumental in advancing substrate processing technologies, which are critical for various applications in electronics manufacturing.

Collaborations

Shinohara has collaborated with notable colleagues, including Shuhei Nemoto and Kazuhiro Shoji. Their combined expertise has contributed to the development of advanced substrate processing techniques.

Conclusion

Ryotaro Shinohara is a key figure in the field of substrate processing, with innovative patents that enhance processing techniques. His contributions continue to impact the semiconductor industry positively.