The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
Mar. 09, 2023
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Shuhei Nemoto, Kyoto, JP;
Kazuhiro Shoji, Kyoto, JP;
Ryotaro Shinohara, Kyoto, JP;
Akira Ito, Kyoto, JP;
Itsuki Kajino, Kyoto, JP;
Assignee:
SCREEN HOLDINGS CO., LTD., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B05B 1/00 (2006.01); B05B 12/02 (2006.01); B05B 13/02 (2006.01); B05B 14/10 (2018.01); B05C 1/00 (2006.01); B05C 11/10 (2006.01);
U.S. Cl.
CPC ...
B05B 13/0228 (2013.01); B05B 1/005 (2013.01); B05B 12/02 (2013.01); B05B 14/10 (2018.02); B05C 1/006 (2013.01); B05C 11/1042 (2013.01); H01L 21/67051 (2013.01); H01L 21/6715 (2013.01);
Abstract
The invention includes a gas supplier for discharging a gas into a space sandwiched between a substrate and a shielding plate by supplying the gas to a gas discharge nozzle provided in the shielding plate to form a flow of the gas from a central part toward a radially outer side of the substrate. This gas supplier is controlled such that a flow velocity of the gas into a discharge space at a peripheral edge part of the substrate becomes larger than zero.