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For the Inventor, By the Inventor

Osaka, Japan

Ryotaro Hanawa

This inventor holds 13 USPTO granted patents, primarily in Photoresist Composition. Top assignee: Sumitomo Chemical Company, Limited. Active years: 1993-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryotaro Hanawa. Retrieved from https://idiyas.com/inventor/ryotaro-hanawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13

% Patents Active = 100.0

Average Co-Inventor Count = 5.5

ph-index = 4

Forward Citations = 40(Granted Patents)


Location History:

  • Ibaraki, JP (1993 - 1998)
  • Osaka, JP (1994 - 2002)

Company Filing History:

goldMedal13 out of 6,969 
 
Sumitomo Chemical Company, Limited
 patents

Years Active: 1993-2002

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Areas of Expertise:
Positive Resist
Radiation-Sensitive Composition
Alkali-Soluble Resin
Quinone Diazide
Photoresist Technology
Styryl Compound
Polyhydric Phenol
Composition Preparation
13 patents (USPTO):Explore Patents
1. 6383708 - Positive resist composition (2002-05-07),
2. 5792585 - Radiation-sensitive positive resist composition (1998-08-11),
3. 5783355 - Radiation-sensitive positive resist composition (1998-07-21),
4. 5736292 - Radiation-sensitive positive resist composition comprising an alkali (1998-04-07),
5. 5714620 - Polyhydric phenol compound and positive resist composition comprising (1998-02-03),
6. 5587492 - Polyhydric phenol compound and positive resist composition comprising (1996-12-24),
7. 5436107 - Positive resist composition (1995-07-25),
8. 5362598 - Quinone diazide photoresist composition containing alkali-soluble resin (1994-11-08),
9. 5354644 - Photoresist compositions comprising styryl compound (1994-10-11),
10. 5336583 - Positive quinonediazide resist composition utilizing mixed solvent of (1994-08-09),
11. 5283324 - Process for preparing radiation sensitive compound and positive resist (1994-02-01),
12. 5218136 - Styryl compounds, process for preparing the same and photoresist (1993-06-08),
13. 5198323 - Resist composition containing alkali-soluble resin, 1,2-quinone diazide (1993-03-30),

Title: Ryotaro Hanawa: Pioneering Inventor from Osaka

Introduction: Ryotaro Hanawa is a distinguished inventor hailing from Osaka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hanawa's recent patents focus on advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With over two decades of experience in the industry, Hanawa has led numerous research projects that have resulted in cutting-edge inventions, earning him recognition as a visionary in his field.

Collaborations: Throughout his career, Hanawa has collaborated with leading tech companies, research institutions, and universities worldwide, fostering a culture of innovation and knowledge-sharing.

Conclusion: Ryotaro Hanawa's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the landscape of technological advancements globally.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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