Niigata, Japan

Ryota Kishi


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Ryota Kishi: Innovator in Trichlorosilane Purification Technology

Introduction

Ryota Kishi is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of silicon crystal purification, holding 2 patents that focus on improving the efficiency of trichlorosilane purification systems. His work is essential for advancing the production of high-purity silicon, which is critical for various technological applications.

Latest Patents

Kishi's latest patents include a purification system of trichlorosilane and a method for producing polycrystalline silicon. The first patent describes a system designed to prevent re-contamination during the purification process. It involves a multistage impurity conversion step that effectively converts impurities into high boiling point compounds, ensuring a cleaner trichlorosilane supply. The second patent outlines a purification technology that minimizes the discharge of chlorosilanes while converting hydrocarbons into low-boiling materials through thermal decomposition. This innovation enhances production efficiency and addresses yield reduction issues in polycrystalline silicon.

Career Highlights

Ryota Kishi is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work at this organization has allowed him to focus on developing advanced purification technologies that are vital for the semiconductor and solar industries. Kishi's expertise in this area has positioned him as a key player in the field of silicon production.

Collaborations

Kishi has collaborated with notable colleagues, including Masahiko Ishida and Shigeyoshi Netsu. Their combined efforts have contributed to the advancement of purification technologies and have fostered innovation within their organization.

Conclusion

Ryota Kishi's contributions to trichlorosilane purification technology are significant and impactful. His patents reflect a commitment to improving production processes in the silicon industry. Kishi's work continues to influence advancements in technology and materials science.

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