This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations by Ryosuke Ochiai in Plasma Processing Technology
Introduction
Ryosuke Ochiai is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of advanced apparatuses that enhance precision in various applications.
Latest Patents
Ryosuke Ochiai holds a patent for a "Plasma processing apparatus and plasma processing method." This high-precision plasma processing apparatus is designed with several key components. It includes a processing chamber where samples undergo plasma processing, a first radio frequency power supply for plasma generation, and a sample stage for loading samples. Additionally, it features a second radio frequency power supply that supplies power to the sample stage, a power supply that applies voltage to the sample stage, and a control unit that manages the power supply. The apparatus operates with a specific voltage waveform cycle, which includes a positive ramp period, a negative ramp period, and a removal amount control period to regulate the removal of charged particles from the sample.
Career Highlights
Ryosuke Ochiai is currently associated with Hitachi High-Tech Corporation. His role at the company allows him to further his research and development in plasma processing technologies. His work has been instrumental in advancing the capabilities of plasma processing apparatuses.
Collaborations
Due to space constraints, the collaborations section has been omitted.
Conclusion
Ryosuke Ochiai's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to enhancing precision in processing methods, showcasing the importance of innovation in technology.