Company Filing History:
Years Active: 2021
Title: The Innovative Contributions of Ryosuke Ebihara
Introduction
Ryosuke Ebihara is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative etching methods. His work has implications for the manufacturing of electronic components, which are essential in today's technology-driven world.
Latest Patents
Ryosuke Ebihara holds a patent for an etching method that enhances the selectivity of silicon nitride regions. This method involves a two-step process where a deposit containing hydrofluorocarbon is first formed on the target regions. The silicon nitride region is then selectively etched using radicals from the hydrofluorocarbon deposit. This innovative approach allows for precise etching, which is crucial in semiconductor fabrication. He has 1 patent to his name.
Career Highlights
Ebihara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves developing advanced technologies that improve the efficiency and effectiveness of semiconductor processing. His expertise in etching methods has positioned him as a valuable asset in the field.
Collaborations
Ryosuke Ebihara collaborates with his coworker, Hikaru Watanabe, to further enhance their research and development efforts. Together, they work on innovative solutions that address the challenges faced in semiconductor manufacturing.
Conclusion
Ryosuke Ebihara's contributions to the field of semiconductor processing through his etching method demonstrate his innovative spirit and technical expertise. His work continues to influence the industry, paving the way for advancements in technology.