Kakegawa, Japan

Ryoma Morita

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Cataler Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoma Morita. Retrieved from https://idiyas.com/inventor/ryoma-morita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ryoma Morita and Exhaust Gas Purification Catalyst Manufacturing

Introduction

Ryoma Morita is an inventor associated with Kakegawa, Japan, and Cataler Corporation. His work includes a patent for a method of manufacturing an exhaust gas purification catalyst.

Latest Patents

Morita is credited with 1 patent. The patent, “Method for Manufacturing Exhaust Gas Purification Catalyst,” describes a process designed to prevent slurry from adhering to a flange and to avoid uncoated areas on a honeycomb structure.

The method holds a base material vertically, inserts a cylindrical partitioning member into its outer cylinder, and positions the partitioning member opposite the honeycomb structure. Slurry is supplied through the partitioning member and drawn from the lower end of the outer cylinder. This arrangement is intended to support more controlled coating during catalyst production.

Career Highlights

Morita’s listed patent focuses on a manufacturing process for exhaust gas purification catalysts. The invention addresses coating consistency by managing how slurry is supplied and removed from the base material.

Collaborations

Morita’s listed coworkers include Takashi Kuwahara and Etsuko Ohara. The patent information provided identifies Cataler Corporation as his company.

Conclusion

Ryoma Morita’s patent describes a practical approach to improving slurry application in honeycomb catalyst manufacturing, with the goal of reducing flange contamination and uncoated areas.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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