Tokyo, Japan

Ryoko Murayama

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Nichiban Co., Ltd., The University of Tokyo. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoko Murayama. Retrieved from https://idiyas.com/inventor/ryoko-murayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ryoko Murayama: Innovator in Medical Dressing Technology

Introduction

Ryoko Murayama is a notable inventor based in Tokyo, Japan. She has made significant contributions to the field of medical technology, particularly in the development of dressing materials for puncture procedures. Although she currently holds no granted patents, her innovative ideas have the potential to impact medical practices.

Latest Patent Applications

One of her recent patent applications is titled "Dressing Material for Puncture." This invention addresses the problem of allowing punctures while observing a blood vessel and puncture needle with an ultrasound examination device. The dressing material is designed to avoid the entry of air between the adhesive and the skin, thereby improving ultrasonic transparency and moisture permeability. The dressing material consists of a support film, a frame sheet, and a release liner, all laminated in a specific order. The support film has a thickness ranging from 10 μm to 80 μm, and the adhesive has a mass per unit area of 30 g/m² to 80 g/m².

Conclusion

Ryoko Murayama's work in developing advanced dressing materials showcases her commitment to enhancing medical procedures. Her innovative approach has the potential to improve patient outcomes in puncture-related medical practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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