The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Dec. 26, 2022
Applicants:

Nichiban Co., Ltd., Tokyo, JP;

The University of Tokyo, Tokyo, JP;

Inventors:

Tatsuya Kanemaru, Tokyo, JP;

Kyohei Matsuo, Tokyo, JP;

Subaru Matsuo, Tokyo, JP;

Hiromi Sanada, Tokyo, JP;

Ryoko Murayama, Tokyo, JP;

Mari Abe, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 13/0246 (2024.01); A61F 13/02 (2024.01); A61M 25/01 (2006.01); A61M 25/02 (2006.01); A61F 13/00 (2006.01);
U.S. Cl.
CPC ...
A61F 13/0256 (2013.01); A61F 13/0253 (2013.01); A61F 13/0266 (2013.01); A61F 2013/00412 (2013.01); A61F 2013/00706 (2013.01); A61F 2013/00846 (2013.01); A61M 25/0108 (2013.01); A61M 2025/0273 (2013.01);
Abstract

A dressing material for puncture of the present invention includes a support film, a frame sheet, and a release liner, which are laminated from an upper side in this order. An adhesive is used to bond the support film and the frame sheet, and bond the frame sheet and the release liner. The support film is a base material having a thickness of from 10 μm to 80 μm. The adhesive has a mass per unit area of from 30 g/mto 80 g/m.


Find Patent Forward Citations

Kanemaru, Tatsuya. (2026). Dressing material for puncture (U.S. Patent No. 12642705). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12642705

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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