Tokyo, Japan

Ryoichi Yoshifuku


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Tokyo, JP (2003 - 2004)
  • Hyogo, JP (2004)
  • Kanagawa, JP (2011)

Company Filing History:


Years Active: 2003-2011

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Ryoichi Yoshifuku: Innovator in Semiconductor Manufacturing

Introduction

Ryoichi Yoshifuku is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on improving the reliability and efficiency of semiconductor devices.

Latest Patents

Yoshifuku's latest patents include a manufacturing method of a semiconductor device aimed at enhancing the reliability of devices that utilize a Metal-Insulator-Semiconductor Field-Effect Transistor (MISFET) with a high dielectric constant gate insulator. This method involves the formation of a first Hf-containing insulating film for n-channel MISFETs and a second Hf-containing insulating film for p-channel MISFETs. The process includes dry etching to create gate electrodes and a series of wet etching processes to remove unneeded portions of the insulating films.

Another notable patent is the method of manufacturing a semiconductor device with a trench element-isolating structure. This involves creating a laminated film on a silicon substrate, patterning it, and forming an element-isolating trench. The trench is then filled with a silicon oxide film, followed by a series of removals of unnecessary films to achieve the desired structure.

Career Highlights

Yoshifuku has worked with notable companies in the semiconductor industry, including Renesas Technology Corporation and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Ryoichi Yoshifuku has collaborated with talented individuals such as Takahiro Maruyama and Kenji Kawai. These collaborations have likely enriched his work and led to advancements in semiconductor manufacturing techniques.

Conclusion

Ryoichi Yoshifuku is a key figure in the semiconductor industry, with a focus on innovative manufacturing methods that enhance device reliability. His contributions through patents and collaborations continue to influence the field significantly.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…