Location History:
- Saitama, JP (1995 - 1998)
- Saitama-ken, JP (2001 - 2004)
Company Filing History:
5 out of 15 
5 out of 21,351 
2 out of 832,880 Years Active: 1995-2004
Title: Ryoichi Kobayashi: Innovator in Photomask Technology
Introduction
Ryoichi Kobayashi is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His innovative work has advanced the manufacturing processes of photomasks, which are essential in the semiconductor industry.
Latest Patents
Kobayashi's latest patents include a phase-shifting photomask blank, a phase-shifting photomask, and methods for producing them, along with an apparatus for manufacturing the blank. His approach involves forming a uniform thin phase-shifting photomask blank by depositing a thin film on a substrate using a reactive sputtering technique. This process requires passing the substrate over a sputtering target at least four times. Notably, he utilizes NO gas as the reactive gas and a target composed of a mixture of molybdenum and silicon. The transparent substrate serves as the thin film-forming substrate, allowing for the creation of a light-transmitting film capable of transmitting light rays that do not substantially contribute to exposure. The film is formed through an opening with an enlarged length along the substrate-conveying direction, ensuring that even regions with a deposition rate of less than 90% of the maximum level contribute to film formation. The resulting phase-shifting photomask blank undergoes a patterning treatment to create the final photomask.
Career Highlights
Throughout his career, Ryoichi Kobayashi has worked with notable companies such as Ulvac Coating Corporation and Mitsubishi Electric Corporation. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to various advancements in the field.
Collaborations
Kobayashi has collaborated with esteemed colleagues, including Akihiko Isao and Nobuyuki Yoshioka. Their combined efforts have further propelled innovations in photomask technology.
Conclusion
Ryoichi Kobayashi's contributions to the field of photomask technology are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing semiconductor manufacturing processes. His work continues to influence the industry and pave the way for future innovations.