Yokohama, Japan

Ryoichi Kaneko

This inventor holds 5 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 1999-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoichi Kaneko. Retrieved from https://idiyas.com/inventor/ryoichi-kaneko-5q2yz130

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 80.0

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 89(Granted Patents)


Location History:

  • Kanagawa-ken, JP (1999 - 2002)
  • Yokohama, JP (2002)

Company Filing History:


Years Active: 1999-2002

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5 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Ryoichi Kaneko**

Introduction

Ryoichi Kaneko, an accomplished inventor based in Yokohama, Japan, has made significant contributions to the field of microdevice manufacturing. With a portfolio of five patents, Kaneko has leveraged his expertise to enhance the precision and efficiency of exposure apparatuses used in producing microdevices.

Latest Patents

Ryoichi Kaneko's latest patents include innovative methods that revolutionize the processes involved in microdevice manufacturing. One patent details a "Method of manufacturing microdevice utilizing combined alignment mark," which describes an exposure apparatus designed to accurately and swiftly transfer mask patterns onto substrates featuring multiple pattern layers. This invention employs sophisticated techniques for forming combined marks on wafer surfaces, allowing for precise positional computations that enhance the alignment of circuit patterns.

Another significant contribution by Kaneko is an "Exposure method for overlaying one mask pattern on another." This method utilizes two exposure apparatuses with differing exposure field sizes to overlay mask patterns on a substrate. The process involves sequentially transferring a first mask pattern while detecting alignment errors and adjusting the rotational positions of the second mask pattern accordingly. This innovative approach aims to improve the accuracy of microdevice production.

Career Highlights

Throughout his career, Kaneko has been associated with Nikon Corporation, a leading company in optical equipment and imaging technology. His inventive work focuses on advancing technologies that facilitate the creation of intricate microdevices critical for modern electronics.

Collaborations

Kaneko collaborates with esteemed colleagues such as Masaharu Kawakubo and Mitsuru Kobayashi, reflecting a shared commitment to innovation within the realm of microdevice manufacturing. Their teamwork has further contributed to developing advanced techniques in the industry.

Conclusion

Ryoichi Kaneko's innovative spirit and dedication to improving microdevice manufacturing processes underscore his importance as an inventor. His contributions, encapsulated in his patents, illustrate the transformative potential of well-executed inventions in shaping the future of technology. As microdevices continue to be integral in various applications, Kaneko's work will undoubtedly inspire future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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