The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Oct. 27, 2000
Mitsuru Kobayashi, Kawasaki, JP;
Ryoichi Kaneko, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus for accurately and quickly transferring mask patterns to a substrate on which a plurality of pattern layers are formed, and a method of manufacturing microdevices that uses the exposure apparatus. A wafer mark (or substitute wafer mark ) of a gate electrode layer and a wafer mark of a second interlayer insulating layer are formed on a street line of a wafer. Mark bars WMnm (n=1, 2, M−1 to 4) of the wafer marks are alternately arranged, and combined marks are formed. The combined marks are simultaneously detected with an alignment system, and positional information of the wafer marks is computed based on the detection results. Then, the circuit patterns on a reticle are aligned with a shot region on the wafer based on the computed positional information.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile