Company Filing History:
Years Active: 2019
Title: Ryohei Tanuma: Innovator in Silicon Carbide Technology
Introduction
Ryohei Tanuma is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of silicon carbide materials. His innovative work has led to advancements in electronic devices, showcasing his expertise and dedication to the industry.
Latest Patents
Ryohei Tanuma holds a patent for a silicon carbide single crystal, which includes a silicon carbide single crystal wafer and a silicon carbide single crystal epitaxial wafer. This patent describes a silicon carbide single crystal that features threading dislocations, each having a dislocation line extending through a C-plane. The Burgers vector includes at least a component in a C-axis direction. The patent specifies that the density of threading dislocations with angles larger than 0° and within 40° is set to 300 dislocations/cm or less. Additionally, the density of threading dislocations with angles larger than 40° is set to 30 dislocations/cm or less.
Career Highlights
Ryohei Tanuma is currently employed at Denso Corporation, where he continues to push the boundaries of silicon carbide technology. His work at Denso has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to semiconductor innovations.
Collaborations
Some of Ryohei Tanuma's coworkers include Takeshi Okamoto and Hiroyuki Kondo. Their collaborative efforts have played a crucial role in advancing the projects they work on together.
Conclusion
Ryohei Tanuma's contributions to silicon carbide technology and his innovative patents highlight his importance in the field of semiconductor research. His work continues to influence the development of electronic devices, making a lasting impact on the industry.