Location History:
- Tokyo, JP (2019 - 2020)
- Tokyo-to, JP (2021)
Company Filing History:
Years Active: 2019-2024
Title: Ryohei Kasai: Innovator in Semiconductor Technology
Introduction
Ryohei Kasai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative wiring structures and methods that enhance the manufacturing processes of semiconductor devices.
Latest Patents
Ryohei Kasai's latest patents include a variety of advanced technologies. These patents encompass a wiring structure and method of manufacturing the same, a semiconductor device, and a multilayer wiring structure. Additionally, he has developed a semiconductor element mounting substrate and a method of forming pattern structures. His work on imprint molds and methods of manufacturing multilayer wiring boards showcases a mold that includes a base material and a rugged structure. This rugged structure features linearly shaped projected portions for wiring and a circularly shaped projected portion for forming a pad portion, which includes a light-shielding layer at its top flat surface.
Career Highlights
Ryohei Kasai is currently employed at Dai Nippon Printing Co., Ltd., where he continues to innovate in the semiconductor field. His expertise and dedication to advancing technology have made him a valuable asset to his company and the industry as a whole.
Collaborations
Throughout his career, Ryohei has collaborated with notable coworkers, including Tadashi Furukawa and Ryo Furugen. These partnerships have contributed to the development of groundbreaking technologies in semiconductor manufacturing.
Conclusion
Ryohei Kasai is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of electronics and manufacturing processes.