Company Filing History:
Years Active: 2002-2007
Title: Ryo Tsujimura: Innovator in Optical Proximity Correction
Introduction
Ryo Tsujimura is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in optical proximity correction. With a total of 2 patents to his name, Tsujimura's work has had a substantial impact on the industry.
Latest Patents
Tsujimura's latest patents include a "Method and system for efficiently verifying optical proximity correction." This innovative method involves generating first and second mask pattern data from design data under different conditions, applying optical proximity correction, and comparing the corrected pattern data to ensure accuracy. Another significant patent is the "Method and apparatus of producing partial-area mask data files." This invention focuses on dividing a full area of a semiconductor integrated circuit into unit areas and producing mask data files based on CAD data, enhancing the efficiency of beam exposure systems and inspection apparatuses.
Career Highlights
Ryo Tsujimura is currently employed at Fujitsu Corporation, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in optical proximity correction has positioned him as a key player in the advancement of this critical area of technology.
Collaborations
Throughout his career, Tsujimura has collaborated with talented individuals such as Tomoyuki Okada and Masahiko Minemura. These collaborations have fostered innovation and contributed to the successful development of his patents.
Conclusion
Ryo Tsujimura's contributions to the field of semiconductor technology, particularly in optical proximity correction, highlight his role as an influential inventor. His patents reflect a commitment to advancing technology and improving manufacturing processes.