Ryo Shibata

Title: Ryo Shibata: Innovator in Semiconductor Technology

Introduction

Ryo Shibata is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

Shibata's latest patents include a "Method for calculating tolerable value for fluctuation in power supply voltage" and a "Method and apparatus for preparing patterns used for manufacture of semiconductor devices." The first patent outlines a method for calculating a tolerable value for simultaneous switching noise in an input/output circuit with a differential input. This method involves providing an input/output circuit with a pulse signal, setting a tolerable range for the output signal, and measuring the duty ratio of the output signal in response to voltage changes. The second patent focuses on preparing layout data of patterns formed in a scribe area, streamlining the process by selecting patterns from library data and arranging them according to specific conditions.

Career Highlights

Throughout his career, Ryo Shibata has worked with prominent companies such as Fujitsu Corporation and Fujitsu Microelectronics Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Shibata has collaborated with notable colleagues, including Yukisada Horie and Takeo Moriyama. These partnerships have fostered a creative environment that has led to innovative solutions in their respective fields.

Conclusion

Ryo Shibata's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations.