Miyagi, Japan

Ryo Matsubara

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryo Matsubara. Retrieved from https://idiyas.com/inventor/ryo-matsubara-tpykzw24

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryo Matsubara

Introduction

Ryo Matsubara is a prominent inventor based in Miyagi, Japan, known for his significant contributions to the field of temperature control methods and devices, particularly within plasma processing apparatus. With two patents to his name, Matsubara's work reflects his dedication to advancing technology and enhancing efficiency in semiconductor manufacturing.

Latest Patents

Matsubara's latest patents include a **Temperature Control Method and Temperature Control Device** and a **Substrate Processing Method**. The temperature control method involves several critical steps to regulate the internal environment of a plasma processing chamber. It includes measuring a pre-processing temperature, determining temperature control conditions, and processing substrates by manipulating the chamber’s temperature conditions using plasma and cooling gas techniques. The substrate processing method details the procedure for changing gas pressure and voltage on an electrostatic chuck, enhancing the electrostatic attraction of substrates during processing. This innovative approach aims to ensure precise and stable substrate handling during manufacturing procedures.

Career Highlights

Ryo Matsubara is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing equipment sector. His role in the company underscores his alliance with industry leaders and positions him as a key contributor to technological advancements in this field.

Collaborations

Matsubara collaborates with notable colleagues such as Yasutaka Hama and Nobuaki Shindo, whose partnership fosters a creative environment that promotes the sharing of ideas and improvement of technologies related to plasma processing and semiconductor manufacturing.

Conclusion

Ryo Matsubara's innovative approaches and significant patents underline his status as an influential inventor in the realm of temperature control in semiconductor processes. As technology continues to evolve, contributions like those from Matsubara will remain vital in driving efficiency and performance in manufacturing technologies, reflecting the importance of continuous innovation in this competitive field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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