Saga, Japan

Ryo Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Tanaka Denshi Kogyo K.k.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryo Ishikawa. Retrieved from https://idiyas.com/inventor/ryo-ishikawa-kyeunadt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ryo Ishikawa: Innovator in Semiconductor Technology

Introduction

Ryo Ishikawa is a notable inventor based in Saga, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on bonding wires.

Latest Patents

Ishikawa holds a patent for a palladium-coated copper bonding wire, which includes a core material primarily made of copper. This bonding wire features a palladium layer with a concentration of palladium between 1.0 mass % and 4.0 mass %. Additionally, it has a work hardening coefficient that indicates a change in elongation rate of 2% or more, with a maximum elongation rate of 0.20 or less.

Career Highlights

Ryo Ishikawa is associated with Tanaka Denshi Kogyo K.K., where he has been instrumental in advancing semiconductor manufacturing techniques. His work has been pivotal in enhancing the reliability and performance of semiconductor devices.

Collaborations

Ishikawa collaborates with talented coworkers, including Mitsuo Takada and Nanako Maeda, contributing to a dynamic and innovative work environment.

Conclusion

Ryo Ishikawa's contributions to semiconductor technology through his patent on palladium-coated copper bonding wire exemplify his innovative spirit and dedication to advancing the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…