This inventor holds 1 USPTO granted patent. Top assignee: Asm International N.v.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Ruud Grisel: Innovator in Semiconductor Processing Technology
Introduction
Ruud Grisel is a notable inventor based in Amersfoort, Netherlands. He has made significant contributions to the field of semiconductor processing, particularly in temperature control technologies. His innovative approach has led to the development of a unique reactor design that enhances the efficiency of substrate heat treatment.
Latest Patents
Ruud Grisel holds a patent for a "Temperature control for single substrate semiconductor processing reactor." This invention features a reactor designed for heat treatment of a substrate, which includes a process chamber within a substrate enclosing structure. The reactor is equipped with a support structure that positions the substrate at a predetermined spacing during processing. Notably, streams of gas can lift the substrate from the support structure, allowing it to float. The design incorporates multiple heating elements associated with the upper and lower parts of the reactor, arranged to create defined heating zones. A controller manages these heating elements individually, ensuring that each zone maintains a specific temperature, thus enabling non-uniform heating across the substrate.
Career Highlights
Ruud Grisel is associated with ASML Holding N.V., a leading company in the semiconductor industry. His work focuses on advancing technologies that improve semiconductor manufacturing processes. His innovative contributions have positioned him as a key figure in the field.
Collaborations
Ruud has collaborated with esteemed colleagues such as Ernst H. Granneman and Vladimir Ivanovich Kuznetsov. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Ruud Grisel's contributions to semiconductor processing technology exemplify the impact of innovation in the industry. His patent for a temperature control reactor showcases his commitment to enhancing manufacturing efficiency. Through his work and collaborations, he continues to influence the future of semiconductor technology.