Russell E Lewis

Title: Innovations by Russell E Lewis in Material Layer Processing

Introduction

Russell E Lewis is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of material layer processing, particularly in the manufacturing of flat panel displays and integrated circuit wafers. His innovative techniques have paved the way for advancements in the industry.

Latest Patents

Russell E Lewis holds a patent titled "Endpoint and uniformity determinations in material layer processing." This patent focuses on techniques for monitoring and controlling the removal or formation of layers of material. The process involves detecting when breakthrough occurs in a preselected number of individual regions across the surface of the layer. By monitoring the removal of material in these regions, a measure of uniformity can be obtained, which can be used to enhance the overall processing uniformity.

Career Highlights

Lewis is currently associated with Luxtron Corporation, where he applies his expertise in material processing. His work has been instrumental in improving the efficiency and effectiveness of manufacturing processes in the technology sector.

Collaborations

Throughout his career, Russell E Lewis has collaborated with notable colleagues, including Richard E Howard and Herbert E Litvak. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Russell E Lewis's contributions to material layer processing demonstrate his commitment to innovation and excellence in technology. His patent and work at Luxtron Corporation highlight the importance of advancements in manufacturing processes.