Kao-Hsiung, Taiwan

Rurng-Chien Chang


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2001

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2 patents (USPTO):Explore Patents

Title: The Innovations of Rurng-Chien Chang

Introduction

Rurng-Chien Chang is a notable inventor based in Kao-Hsiung, Taiwan, recognized for his contributions to the semiconductor industry. With a total of two patents to his name, Chang has made significant strides in advancing methodologies used in chemical mechanical polishing (CMP) processes.

Latest Patents

Chang's latest patents showcase his innovative approaches to enhancing slurry filtering techniques in semiconductor wafer processing. One of his notable inventions involves a magnetic filtration system designed for slurries used in CMP. This system utilizes strategically placed magnets along the piping network that connects a slurry reservoir to the CMP apparatus. By doing so, it effectively attracts and removes iron oxide particles, reducing defects during the polishing process.

Additionally, his second patent introduces a method for two-slurry CMP polishing using abrasives of varying particle sizes. This innovation involves a dual approach where the wafer is polished sequentially with two slurries, each containing abrasive particles of different sizes. The result is a more efficient and refined polishing operation that enhances the overall quality of the semiconductor wafers.

Career Highlights

Rurng-Chien Chang has lent his expertise to companies like Promos Technologies, Inc., where he applied his skills in semiconductor manufacturing and polishing technologies. His role at Promos Technologies significantly impacted the development of advanced processing techniques, further establishing him as a prominent figure in the field.

Collaborations

Throughout his career, Chang has worked closely with talented individuals such as Champion Yi and Jiun-Fang Wang. These collaborations have fostered a creative environment that encourages the sharing of ideas, leading to innovative solutions in semiconductor processing.

Conclusion

Rurng-Chien Chang's contributions to the field of semiconductor technology through his patents demonstrate a commitment to innovation and excellence. His work not only improves CMP processes but also sets a standard for future developments in the industry. With his expertise and collaborative spirit, Chang continues to inspire advancements that have the potential to reshape the semiconductor landscape.

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