Beijing, China

Rujian Li


Average Co-Inventor Count = 8.1

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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3 patents (USPTO):

Title: Inventor Spotlight: Rujian Li

Introduction

Rujian Li, an accomplished inventor hailing from Beijing, China, has made significant contributions to the field of ion implantation technology. With a remarkable portfolio of three patents, his work focuses on enhancing the efficiency and precision of ion implantation processes.

Latest Patents

Rujian's latest patents include innovative devices and methods aimed at improving ion implantation technologies. One of his notable inventions is the "Ion Implantation Amount Adjustment Device and Method." This device features an adjuster that can regulate the ion outlet of the ion implantation apparatus, allowing for precise control of ion flow. Additionally, he has developed an "Ion Implantation Apparatus and Determination Method," which complements his first invention by enhancing the operational accuracy of ion implantation systems. Furthermore, his patent titled "Bearing Device and Ion Implantation Device" introduces a bearing table capable of supporting substrates at adjustable positions, greatly improving the adaptability of ion implantation setups.

Career Highlights

Throughout his career, Rujian Li has worked with prominent companies in the optoelectronics industry, including Chengdu BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience at these firms has provided him with a solid foundation in advanced technology development.

Collaborations

Rujian's inventive journey has also been enriched by collaborations with notable professionals, including his coworkers Chenliang Liu and Kang Luo. These partnerships have fostered innovative approaches and solutions within the realm of ion implantation technology.

Conclusion

Rujian Li stands out as a visionary inventor whose innovations in ion implantation technology are paving the way for enhancements in the field. His contributions are not only instrumental in advancing technology but also reflect his commitment to excellence in engineering and invention.

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