This inventor holds 1 USPTO granted patent and 23 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Ruiying Hao and Chamber Cleaning Innovation.
Introduction
Ruiying Hao is an inventor associated with San Jose, California, and Applied Materials, Inc. Her disclosed work addresses the removal of metal-containing films from process-tool chambers.
Latest Patents
Hao is credited with 1 patent, titled “Process and Apparatus to Remove Metal-Containing Films from a Chamber.” The patent describes generating a remote plasma and flowing its reactive species, along with a hydrocarbon gas, into a chamber. The gases react within the chamber to help etch and remove metal-containing material.
Career Highlights
Hao’s patent focuses on chamber cleaning in semiconductor processing equipment. The disclosed approach combines remote-plasma-generated reactive species with hydrocarbon gas to remove metal-containing layers.
Collaborations
Hao is associated with Applied Materials, Inc. Her coworker is Kelvin Chan.
Conclusion
Ruiying Hao’s patent documents an approach to removing metal-containing films from equipment chambers, contributing to innovation in semiconductor process cleaning.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile