The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Jul. 20, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kelvin Chan, San Ramon, CA (US);

Ruiying Hao, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23F 1/44 (2013.01); C23C 16/45565 (2013.01);
Abstract

Embodiments disclosed herein include methods for removing a metal containing layer from a chamber of a tool. In an embodiment, the method comprises generating a remote plasma in the tool. The method may continue with flowing reactive species from the remote plasma into the chamber, and flowing a hydrocarbon gas into the chamber. In an embodiment, the method may include reacting the reactive species with the hydrocarbon gas within the chamber. In an embodiment, the method may further comprise etching the metal-containing material in the chamber.


Find Patent Forward Citations

Chan, Kelvin. (2026). Process and apparatus to remove metal-containing films from a chamber (U.S. Patent No. 12680173). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12680173

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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