This inventor holds 2 USPTO granted patents. Top assignee: Brother Kogyo Kabushiki-Kaisha. Active years: 1999-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999-2004
Title: Rui Zhang: Embroidery Data Processing and Sewing-System Management
Introduction
Rui Zhang is an inventor associated with Nagoya, Japan, and Brother Kogyo Kabushiki-Kaisha. His work includes inventions for managing embroidery sewing machines and processing embroidery data. The supplied information lists 2 patents.
Latest Patents
**Sewing Apparatus Management System.** This invention connects a management computer to terminals on multiple embroidery sewing machines through a network. The computer stores information that groups the machines according to predetermined categories. A supervisor can select a group to view its management information and send instructions specifically to the machines in that group, enabling selective oversight and control.
**Embroidery Data Processing for Extracting Contour of an Embroidery.** This invention uses a computer to identify stitch points and display the contours of an embroidery pattern. It establishes a coordinate system based on the first stitch points, then compares point coordinates to determine which stitches belong to the contour. The process also detects half-stitch needle locations to help isolate contour points accurately.
Career Highlights
Zhang’s listed inventions address two complementary aspects of embroidery technology: coordinating multiple sewing machines and analyzing stitch data. Together, they illustrate how software and computer-based methods can support both equipment management and pattern processing.
Collaborations
The supplied information identifies Brother Kogyo Kabushiki-Kaisha as Zhang’s company and lists Gyomei Tei and Xiao Ming Zheng as coworkers.
Conclusion
Rui Zhang’s listed patents focus on practical tools for managing embroidery equipment and extracting pattern contours from stitch data, reflecting the role of computing in modern embroidery systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
