The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 1999
Filed:
Nov. 14, 1997
Xiao Ming Zheng, Nagoya, JP;
Rui Zhang, Nagoya, JP;
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
An embroidery data process using a computer to extract stitch points from embroidery data and display the contours of an embroidery pattern to the user based on those stitch points. After the stitch points are extracted from the sewing data, an orthogonal coordinate system is defined by setting the first stitch point as the origin and the line formed from the first to the second stitch points as the X-axis. Then, using the first stitch point as the origin, the X components of the second and third stitch points are compared. If the X component of the second point is larger than that of the third, the second stitch point is determined to be a contour point. By continuing this process, all the contour points can be accurately extracted from the sewing data and displayed for the user. Also, to collect only the contour points, half stitch needle locations are detected. For example, for an array (Qi) of odd locations, the stitch point Qi+1 is determined to be the half stitch when a sign of the Y component of Qi+1 on an orthogonal coordinate system is in coincidence with a sign of the Y component of the stitch point in an array of even locations. The coordinate system is defined by setting Qi as the origin and the line formed from Qi to Qi+2 as the X-axis.