Location History:
- Waukesha, WI (US) (2019)
- Shanghai, CN (2009 - 2023)
Company Filing History:
Years Active: 2009-2025
Title: The Innovative Contributions of Rui Guo
Introduction
Rui Guo is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of technology, particularly in the development of advanced semiconductor devices and application programming interfaces. With a total of 8 patents to his name, Guo's work has had a substantial impact on various technological applications.
Latest Patents
One of Rui Guo's latest patents is an application programming interface designed to provide information. This invention involves apparatuses, systems, and techniques that enable information to be accessed as a result of memory transactions. The API facilitates the delivery of information to users efficiently. Another notable patent is related to a semiconductor device that includes conductive bumps to improve electromagnetic interference (EMI) and radio frequency interference (RFI) shielding. This semiconductor device features a substrate with grounded contact pads and conductive bumps made of gold or other non-oxidizing materials, enhancing its performance in preventing EMI and RFI radiation.
Career Highlights
Throughout his career, Rui Guo has worked with several esteemed companies, including General Electric Company and China UnionPay Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects that push the boundaries of technology.
Collaborations
Rui Guo has collaborated with notable colleagues such as Hongfeng Chai and Yuemin Qi. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Rui Guo's contributions to the field of technology through his patents and collaborations highlight his innovative spirit and dedication to advancing the industry. His work continues to influence the development of new technologies that enhance our daily lives.