Rudolf D Steinmetz

Title: Rudolf D. Steinmetz and Photographic Materials Innovation.

Introduction

Rudolf D. Steinmetz is an inventor associated with Rochester, New York, and Eastman Kodak Company. His patent work addresses the design of photographic elements and their protective coatings.

Latest Patents

Steinmetz is credited with 1 patent, titled “Photographic Elements Containing Matte Particles of Bimodal Size.” The invention describes a photographic element with a support, at least one light-sensitive layer, and a protective overcoat containing a hydrophilic binder and permanent matte particles made from methyl methacrylate polymer. The particles are arranged in two size modes: a smaller mode with a mean size of 0.2 to 1.2 micrometers and a larger mode with a mean size of 1.5 to 10 micrometers. The patent specifies coating-weight ranges for both modes and a combined particle coating weight greater than 100 mg/m².

Career Highlights

Steinmetz’s listed company affiliation is Eastman Kodak Company, a company associated with photographic technologies. His patent reflects work on controlling the surface properties of photographic elements through a protective overcoat and carefully specified matte-particle sizes.

Collaborations

The provided information names Yongcai Wang and Alfred B. Fant as Steinmetz’s coworkers. Their inclusion indicates professional associations, though the available details do not specify their roles in the patent.

Conclusion

Rudolf D. Steinmetz’s patent documents a specific approach to photographic-element coatings, using two sizes of permanent matte particles to shape the protective layer’s design.