The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 1997

Filed:

Sep. 25, 1995
Applicant:
Inventors:

Alfred B Fant, Rochester, NY (US);

Yongcai Wang, Penfield, NY (US);

Dennis E Smith, Rochester, NY (US);

Melvin M Kestner, Hilton, NY (US);

Rudolf D Steinmetz, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430537 ; 430496 ; 430950 ; 430961 ; 430536 ;
Abstract

In accordance with the present invention, a photographic element comprises a support, at least one light-sensitive layer, and a protective overcoat comprising a hydrophilic binder and permanent matte particles, the permanent matte particles comprising a polymer of methyl methacrylate and having a size distribution of a first and a second mode, with the first mode being composed of particles having a mean particle size of from 0.2 to 1.2 micrometers in a coating weight of from 10 to 200 mg/m.sup.2 and the second mode having a mean particle size of from 1.5 to 10 micrometers in a coating weight of from 5 to 150 mg/m.sup.2, the total coating weight of the particle of the first and the second modes being greater than 100 mg/m.sup.2.


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