Faistenhaar, Germany

Rudiger Haas

This inventor holds 3 USPTO granted patents. Top assignees: Oem Messtechnik Gmbh, Schott Glaswerke, Steinheil Industrielle Messtechnik Gmbh. Active years: 1988-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rudiger Haas. Retrieved from https://idiyas.com/inventor/rudiger-haas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1988-1998

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3 patents (USPTO):Explore Patents

Title: The Innovations of Rudiger Haas

Introduction

Rudiger Haas is a notable inventor based in Faistenhaar, Germany. He has made significant contributions to the field of measurement technology, holding a total of three patents. His work focuses on enhancing the accuracy and efficiency of various measurement processes.

Latest Patents

Haas's latest patents include a "Method and device for the measurement of off-center rotating components" and a "Method of inspecting the dimensional accuracy of medical ampuls." These innovations reflect his commitment to improving precision in industrial and medical applications.

Career Highlights

Throughout his career, Rudiger Haas has worked with prominent companies such as Steinheil Industrielle Messtechnik GmbH and Oem Messtechnik GmbH. His experience in these organizations has allowed him to develop and refine his innovative ideas in measurement technology.

Collaborations

Haas has collaborated with notable colleagues, including Hans-Ulrich Dassler and Johann Lang. Their combined expertise has contributed to the advancement of measurement techniques in their respective fields.

Conclusion

Rudiger Haas's contributions to measurement technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact various industries, showcasing the importance of innovation in enhancing precision and accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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