Walsrode, Germany

Rudi Klein

This inventor holds 8 USPTO granted patents and 1 EPO patent. Top assignees: Wolff Walsrode Ag, Wolff Walsrode Aktiengessellschaft. Active years: 1983-2003.


% Patents Active = 87.5

 

Average Co-Inventor Count = 2.3

ph-index = 6

Forward Citations = 82(Granted Patents)


Company Filing History:


Years Active: 1983-2003

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8 patents (USPTO):Explore Patents

Title: Rudi Klein: Innovator in Multilayer Film Technology

Introduction

Rudi Klein is a notable inventor based in Walsrode, Germany. He has made significant contributions to the field of packaging materials, particularly through his innovative multilayer film technologies. With a total of 8 patents to his name, Klein's work has had a substantial impact on the industry.

Latest Patents

Klein's latest patents include a multilayer film with lamination and heat-sealable sides, which features antifogging properties. This multilayer film comprises an inner layer of ethylene/vinyl alcohol copolymer, coupled with various layers that enhance its functionality. The design includes a heat-sealable layer and a lamination side, making it suitable for diverse packaging applications. Additionally, he has developed polyamide mixtures that contain solid particles, further showcasing his innovative approach to material science.

Career Highlights

Throughout his career, Rudi Klein has worked with prominent companies such as Wolff Walsrode AG and Wolff Walsrode Aktiengesellschaft. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in packaging technology.

Collaborations

Klein has collaborated with notable colleagues, including Andreas Siegmar Gasse and Gregor Kaschel. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the field.

Conclusion

Rudi Klein's contributions to multilayer film technology and packaging materials have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in material science.

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