Shanghai, China

Rubin Ye

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):Explore Patents

Title: Innovator in Plasma Technology: Rubin Ye

Introduction

Rubin Ye is a notable inventor based in Shanghai, China, recognized for his contributions to plasma technology. With a total of three patents to his name, he has made significant advancements in processing apparatuses used in various applications, particularly within the semiconductor industry.

Latest Patents

Among his latest inventions is a sophisticated plasma reactor designed to optimize the processing of wafers. This reactor features a unique process chamber with a base connected to an RF power source, allowing for effective plasma generation. The design incorporates an upper electrode assembly and a plasma processing space, forming a well-orchestrated system for material treatment. Additionally, the reactor includes a conductive ground ring and multiple gas channels ensuring efficient gas management during operation.

Another patent centers around the lift pin assembly combined with an electrostatic chuck. This innovative assembly enhances the capability to manage wafer pressure effectively during processing. By utilizing a sealing ring within the lift pin receiving channel, Rubin's invention prevents unwanted gas from entering. This precise control mechanism guarantees a higher degree of processing efficiency.

Career Highlights

Rubin Ye is currently employed at Advanced Micro-Fabrication Equipment Inc. in China, a position that allows him to engage with cutting-edge technology and collaborate on groundbreaking projects in the field of micro-fabrication. His work is critical in advancing the capabilities and reliability of manufacturing equipment, particularly in semiconductor production.

Collaborations

Throughout his career, Rubin has worked alongside esteemed colleagues such as Leyi Tu and Lei Wu. This collaborative environment has not only fostered innovation but also streamlined the development of impactful technologies that push the boundaries of what is possible in plasma processing and micro-fabrication.

Conclusion

Rubin Ye stands out as a leading figure in the plasma technology sector, with a keen focus on innovative solutions that enhance manufacturing efficiency. His contributions through inventions and patents reflect a commitment to excellence and a forward-thinking approach in his field, showcasing his role as a vital contributor to the future of technology in Shanghai and beyond.

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