Amersfoort, Netherlands

Ruben Haverkort

This inventor holds 2 USPTO granted patents. Top assignees: Asm America, Inc., Asm International N.v.. Active years: 2007-2009.


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 109(Granted Patents)


Company Filing History:


Years Active: 2007-2009

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2 patents (USPTO):Explore Patents

Title: Ruben Haverkort: Innovator in Silicon Compound Technologies

Introduction

Ruben Haverkort is a notable inventor based in Amersfoort, Netherlands. He has made significant contributions to the field of silicon compound technologies, holding 2 patents that showcase his innovative approaches.

Latest Patents

Haverkort's latest patents include advancements in remote plasma activated nitridation and low temperature silicon compound deposition. The remote plasma activated nitridation patent describes a method where a nitrogen precursor, activated by exposure to remotely excited species, is used to form nitrogen-containing layers. This process allows for higher levels of nitrogen incorporation compared to traditional methods. The low temperature silicon compound deposition patent outlines a sequential process to create ultra high-quality silicon-containing compound layers at low temperatures, utilizing trisilane as a silicon precursor and nitrogen radicals for nitriding.

Career Highlights

Throughout his career, Ruben Haverkort has worked with prominent companies such as ASM International N.V. and ASM America, Inc. His work has significantly impacted the development of advanced materials and processes in the semiconductor industry.

Collaborations

Haverkort has collaborated with notable colleagues, including Yuet Mei Wan and Marinus J De Blank, contributing to various innovative projects and research initiatives.

Conclusion

Ruben Haverkort's contributions to silicon compound technologies and his innovative patents reflect his expertise and dedication to advancing the field. His work continues to influence the semiconductor industry and inspire future innovations.

Profile summary based on public USPTO records.
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