Rong Xiang

Title: Rong Xiang and Real-Time Characterization of Chemical Vapor Deposition

Introduction

Rong Xiang is an inventor associated with Zhejiang University in Hangzhou, China. His patent work focuses on improving the monitoring and characterization of chemical vapor deposition (CVD), a process used to deposit materials onto surfaces.

Latest Patents

The provided information lists one patent for Rong Xiang: Absorption spectrum-based chemical vapor deposition online in-situ characterization system and method.

The invention combines an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD device. By modifying the CVD equipment and applying environmental compensation, the system is designed to measure the deposition process accurately under high-temperature and low-pressure conditions. Its real-time measurements can help track changes in a sample or reaction system over time and assess how temperature and pressure affect those changes.

Automatic optical-path calibration enables measurements at different positions within the quartz tube during deposition. This capability can help identify the sample’s growth window and determine suitable deposition conditions. The patent record provided lists 1 patent.

Career Highlights

Xiang’s listed invention addresses a practical challenge in CVD research: obtaining reliable, in-situ measurements in demanding process environments. The system’s combination of spectral detection, environmental compensation, and optical-path calibration is intended to support more precise process analysis.

Collaborations

The provided information names Yicheng Ma and Lingfeng Wang as Xiang’s coworkers. It does not specify their roles in the patent or describe the nature of their collaboration.

Conclusion

Rong Xiang’s listed patent presents an approach to real-time CVD characterization that may help researchers monitor deposition, evaluate environmental effects, and identify suitable growth conditions.