Company Filing History:
Years Active: 2002-2007
Title: Rong-Hui Kao: Innovator in Semiconductor Technology
Introduction
Rong-Hui Kao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on improving the reliability and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is titled "Sidewall spacer for semiconductor device and fabrication method thereof." This invention involves an offset spacer layer for an LDD ion implantation process, which is formed by blanket deposition without the need for photolithography and dry etch processes. The offset spacer layer remains on LDD regions during the ion implantation process, preventing silicon loss and dosage contamination, while enhancing device reliability. Another notable patent is the "Method for cleaning a silicon-based substrate without NH4OH vapor damage." This method allows for the cleaning of a silicon-based substrate in an ammonia-containing solution without damaging the silicon surface. It involves forming a very thin silicon oxide layer on the silicon surface, enabling safe cleaning without the formation of silicon holes.
Career Highlights
Rong-Hui Kao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor manufacturing.
Collaborations
Rong-Hui has collaborated with notable colleagues, including Jih-Churng Twu and Chia-Chun Cheng. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.
Conclusion
Rong-Hui Kao's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and improve device reliability.