Company Filing History:
Years Active: 2011-2013
Title: The Innovative Contributions of Ronald L Kinder
Introduction
Ronald L Kinder is a notable inventor based in Oakland, CA, who has made significant contributions to the field of plasma technology. With a total of 4 patents to his name, Kinder's work focuses on enhancing plasma density and improving metallization methods in semiconductor devices.
Latest Patents
One of Kinder's latest patents is a method and apparatus for increasing local plasma density in magnetically confined plasma. This invention involves an ion extractor designed to transfer ions and electrons from a region of higher density plasma to a region of lower density plasma, ultimately increasing the plasma density near the substrate. The ion extractor operates with a positive bias of about 50-300 V, facilitating the transfer of electrons and ions to form a higher density plasma suitable for deposition and resputtering.
Another significant patent by Kinder pertains to PVD-based metallization methods for fabricating interconnections in semiconductor devices. This method allows for the filling of recessed features on a Damascene substrate with metals such as copper and aluminum, without forming voids. By utilizing high-density plasma characterized by high fractional ionization of metal, Kinder's approach ensures that the metal is deposited within the recess without creating large overhangs at the opening.
Career Highlights
Ronald L Kinder has established himself as a key figure in the semiconductor industry through his innovative patents and contributions. His work at Novellus Systems Incorporated has positioned him at the forefront of advancements in plasma technology and metallization methods.
Collaborations
Throughout his career, Kinder has collaborated with talented individuals such as Anshu A Pradhan and Alexander Dulkin, further enhancing the impact of his work in the field.
Conclusion
In summary, Ronald L Kinder's innovative contributions to plasma technology and semiconductor fabrication have made a lasting impact on the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.