The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
May. 24, 2007
Anshu A. Pradhan, San Jose, CA (US);
Douglas B. Hayden, San Jose, CA (US);
Ronald L. Kinder, Oakland, CA (US);
Alexander Dulkin, Sunnyvale, CA (US);
Anshu A. Pradhan, San Jose, CA (US);
Douglas B. Hayden, San Jose, CA (US);
Ronald L. Kinder, Oakland, CA (US);
Alexander Dulkin, Sunnyvale, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Local plasma density, e.g., the plasma density in the vicinity of the substrate, is increased by providing an ion extractor configured to transfer ions and electrons from a first region of magnetically confined plasma (typically a region of higher density plasma) to a second region of plasma (typically a region of lower density plasma). The second region of plasma is preferably also magnetically shaped or confined and resides between the first region of plasma and the substrate. A positively biased conductive member positioned proximate the second region of plasma serves as an ion extractor. A positive bias of about 50-300 V is applied to the ion extractor causing electrons and subsequently ions to be transferred from the first region of plasma to the vicinity of the substrate, thereby forming higher density plasma. Provided methods and apparatus are used for deposition and resputtering.