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Years Active: 1999-2006
Title: The Innovative Contributions of Ronald Hoyer
Introduction
Ronald Hoyer is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced methods and systems for fabricating nanostructures and surface treatment of semiconductor wafers.
Latest Patents
Hoyer's latest patents include a "Method and system for fabricating free-standing nanostructures." This innovative system involves introducing a semiconductor wafer into a process chamber where an etching chemistry is injected to etch a patterned layer and release free-standing nanostructures. The etching chemistry utilizes supercritical or liquid carbon dioxide fluid along with an etching solution. The semiconductor wafer is then rinsed and dried using the same carbon dioxide fluid.
Another significant patent is the "Device for performing surface treatment on semiconductor wafers." This device features a cassette designed to accommodate multiple wafers, which are aligned in a first row. The cassette has openings on its side-wall that are connected to supply channels for transporting a surface treatment medium. The design allows for variable cross-sections of the openings, enhancing the efficiency of the surface treatment process.
Career Highlights
Throughout his career, Ronald Hoyer has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and Siemens Aktiengesellschaft. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.
Collaborations
Hoyer has collaborated with several professionals in his field, including Audrey Dupont and Russ Arndt. These collaborations have likely fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Ronald Hoyer's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods for fabricating nanostructures and surface treatment devices continue to influence advancements in semiconductor manufacturing.