Company Filing History:
Years Active: 2015
Title: Innovations of Ronald G Jordan
Introduction
Ronald G Jordan is an accomplished inventor based in Sugar Grove, OH (US). He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His innovative work has led to advancements in the manufacturing of thin films used in various applications.
Latest Patents
Ronald G Jordan holds a patent for a sputtering target made of aluminum and one or more alloying elements, including Ni, Co, Ti, V, Cr, Mn, Mo, Nb, Ta, W, and rare earth metals. This invention enhances the uniformity of deposited wiring films by affecting the target's recrystallization process. The patent specifies that the alloying element content ranges from 0.01 to 100 ppm by weight, which is crucial for preventing dynamic recrystallization of pure aluminum and aluminum alloys. Additionally, the incorporation of small amounts of alloying elements improves the thermal stability and electromigration resistance of thin films while maintaining low electrical resistivity and good etchability. The invention also outlines a method for manufacturing microalloyed aluminum and aluminum alloy sputtering targets.
Career Highlights
Ronald G Jordan is associated with Tosoh Smd, Inc., where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the technology behind sputtering targets, which are essential in various electronic applications.
Collaborations
Ronald has collaborated with notable colleagues, including Eugene Y Ivanov and Yongwen Yuan. Their combined efforts have contributed to the success of projects within their field.
Conclusion
Ronald G Jordan's contributions to the field of sputtering targets exemplify the impact of innovative thinking in materials science. His patent and work at Tosoh Smd, Inc. highlight the importance of collaboration and advancement in technology.