Ronald C Stern

Title: Innovations of Ronald C Stern

Introduction

Ronald C Stern is a notable inventor based in Cheshunt, GB, recognized for his contributions to the field of semiconductor technology. He holds a total of four patents, showcasing his innovative approach to metal deposition processes.

Latest Patents

One of his latest patents is for a metallization plant, which is an apparatus designed for depositing metal or alloy films through a thermal decomposition process on a substrate. This apparatus features a furnace with multiple selectively heated zones, allowing for precise temperature control to compensate for variations in reactant material concentrations. Additionally, it includes safety measures for handling highly pyrophoric organometallic reactants. This technology is particularly useful for depositing aluminum/silicon alloy films on semiconductor wafers, which are essential in the manufacture of integrated circuits. Another significant patent involves the formation of aluminum conductor tracks on semiconductor bodies. This process utilizes vapor deposition of aluminum from tri-isobutyl aluminum, followed by selective etching of the routing. The semiconductor surface is activated in a hydrogen discharge with the presence of a transport metal, enhancing the efficiency of the deposition process.

Career Highlights

Ronald C Stern has made significant strides in his career, particularly through his work at Itt Industries, Inc. His innovative patents have contributed to advancements in semiconductor manufacturing, making him a key figure in the industry.

Collaborations

Throughout his career, Ronald has collaborated with notable professionals such as Rudolf A Heinecke and Michael J Cooke, further enhancing the impact of his work in the field.

Conclusion

In summary, Ronald C Stern's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of integrated circuit manufacturing.