Company Filing History:
Years Active: 1988-1995
Title: Innovations of Ronald C Pennell
Introduction
Ronald C Pennell is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work primarily focuses on methods and structures that enhance the performance and reliability of electronic devices.
Latest Patents
One of his latest patents is the "Wafer etch protection method." This method involves etching a semiconductor wafer by forming a highly doped region in the periphery of the wafer, which is substantially etch resistant compared to the portion being etched. This innovation aims to improve the precision and effectiveness of the etching process. Another significant patent is the "High voltage thin film transistor on PLZT and method of manufacture." This patent discloses a high voltage thin film transistor structure that enables the fabrication of matrix displays with integrated pixel switches on PLZT substrates. The polysilicon transistor described can withstand more than 60 V across the source and drain, showcasing a remarkable on to off current ratio exceeding 10³.
Career Highlights
Ronald C Pennell is associated with Motorola Corporation, where he has contributed to various projects and innovations in semiconductor technology. His expertise in developing advanced electronic components has positioned him as a valuable asset in the industry.
Collaborations
Throughout his career, Ronald has collaborated with notable colleagues, including Richard D Catero and Stephen L Lovelis. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies.
Conclusion
In summary, Ronald C Pennell is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His patents reflect his commitment to innovation and excellence in the field.