Gärtringen, Germany

Rolf Schafer

This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1981-1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rolf Schafer. Retrieved from https://idiyas.com/inventor/rolf-schafer-zfkggrsb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 42(Granted Patents)


Location History:

  • Gartringen-Rohrau, DE (1981)
  • Gaertringen-Rohrau, DE (1986)

Company Filing History:


Years Active: 1981-1986

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2 patents (USPTO):Explore Patents

Title: Rolf Schafer: Innovator in Magnetic Disk Technology

Introduction

Rolf Schafer is a notable inventor based in Gartringen, Germany. He has made significant contributions to the field of magnetic recording technology. With a total of 2 patents, Schafer's work focuses on innovative materials and methods that enhance the performance of magnetic disks.

Latest Patents

One of Schafer's latest patents is for a composite magnetic disk with silicon and silicon carbide substrate. This invention relates to a composite magnetic disk designed for magnetic recording. It consists of an annular core made of polymeric material, bonded to at least one disk of reaction-bonded silicon carbide, which features a magnetic recording layer on its outer surface. The processed SiSiC disk surface exhibits optimum planarity and smoothness, making it suitable for use as a magnetic disk substrate. Additionally, the material boasts a low density and an extremely high specific modulus of elasticity, enabling higher revolution numbers than previously achievable with known AlMg5 disk substrates.

Another significant patent by Schafer is an apparatus and method for selective electrochemical etching. This invention describes a system that allows for the selective electrochemical etching of a surface. The apparatus includes a cathode and multiple connectors that attach to the workpiece's surface to be etched. When operated, the potential of the connectors is set so that the cathode is at least as negative as the lowest potential of the connectors. This method facilitates the establishment of an etched planar surface that may be inclined relative to the original surface.

Career Highlights

Rolf Schafer is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of technology. His work has contributed to advancements in magnetic recording and electrochemical processes.

Collaborations

Schafer has collaborated with notable colleagues, including Joachim Buhne and Axel Stoffel, who have also contributed to the field of technology.

Conclusion

Rolf Schafer's contributions to magnetic disk technology and electrochemical etching demonstrate his innovative spirit and commitment to advancing the field. His patents reflect a deep understanding of materials and processes that enhance performance in magnetic recording applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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