The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 1981

Filed:

Apr. 25, 1980
Applicant:
Inventors:

Joachim Buhne, Heimsheim, DE;

Rolf Schafer, Gartringen-Rohrau, DE;

Axel Stoffel, Gultingen, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F / ; C25F / ;
U.S. Cl.
CPC ...
2041293 ; 20412943 ; 20412965 ; 20412975 ; 2042 / ; 204228 ; 204D / ;
Abstract

An apparatus and method for selectively electrochemically etching a surface is described. The use of the apparatus and the related method allows the establishment of etched planar surface which may be inclined with respect to the original surface. The apparatus has a cathode and multiple connectors which attach to the workpiece whose surface is to be etched. When the apparatus is operated the potential of the connectors are set so that the cathode is at least as negative as the lowest potential of the connectors.


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