Roland Luethi-Oetterli

Title: The Innovative Contributions of Roland Luethi-Oetterli

Introduction

Roland Luethi-Oetterli is a notable inventor based in Riehen, Switzerland. He has made significant contributions to the field of technology, particularly in the area of pattern definition on substrates. His innovative work has implications for various applications, including micromechanics, microoptics, and microelectronics.

Latest Patents

Luethi-Oetterli holds a patent for an "Apparatus and method for defining a pattern on a substrate." This invention provides a unique apparatus and method that utilizes a shadow masking technique to define patterns on substrates. The apparatus includes a flexible member with a movable portion and at least one aperture, which acts as a shadow mask positioned above the substrate. It also features a support for the substrate, distance-controlling means, and an actuator for relative movement between the flexible member and the substrate. An emission source is included to emit materials, electrons, or light through the shadow mask to define the desired pattern.

Career Highlights

Luethi-Oetterli is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His work has been recognized for its potential to advance technology in multiple fields.

Collaborations

Throughout his career, Luethi-Oetterli has collaborated with esteemed colleagues, including Juergen P Brugger and James K Gimzewski. These collaborations have further enhanced the impact of his inventions and research.

Conclusion

Roland Luethi-Oetterli's contributions to the field of technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of new technologies and applications.