The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Sep. 28, 1999
Juergen P. Brugger, Enschede, NL;
James K. Gimzewski, Rueschlikon, CH;
Pierre L. Guéret, Thalwil, CH;
Roland Luethi-Oetterli, Riehen, CH;
Räto R. Schlittler, Schoenenberg, CH;
Mark E. Welland, Trumpington, GB;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention provides an apparatus and a method for defining a pattern on a substrate using a shadow masking technique. Said apparatus comprises a flexible member having a movable portion and at least one aperture. The flexible member is positioned in operation above the substrate thereby acting as a shadow mask. The apparatus further comprises a support for the substrate, distance-controlling means for controlling the distance between said movable portion and said substrate, and an actuator for moving the flexible member and substrate relative to each other parallel to a surface of the substrate. The apparatus further comprises an emission source which emits materials, electrons or light and which aims through the shadow mask at the substrate where the pattern is defined. Such a pattern might be employed in micromechanic, microoptic or microelectronic devices, for example. The described apparatus may be implemented using the AFM principal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile