This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Juergen P Brugger: Innovator in Substrate Patterning Technology
Introduction
Juergen P Brugger is a notable inventor based in Enschede, Netherlands. He has made significant contributions to the field of substrate patterning technology, particularly through his innovative patent.
Latest Patents
Juergen P Brugger holds a patent for an "Apparatus and method for defining a pattern on a substrate." This invention provides a unique apparatus and method that utilizes a shadow masking technique to define patterns on substrates. The apparatus includes a flexible member with a movable portion and at least one aperture, which acts as a shadow mask positioned above the substrate. It also features a support for the substrate, distance-controlling means to manage the distance between the movable portion and the substrate, and an actuator for relative movement. The emission source in the apparatus emits materials, electrons, or light, aiming through the shadow mask to define the pattern on the substrate. This technology has potential applications in micromechanical, micro-optical, or microelectronic devices.
Career Highlights
Juergen P Brugger is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop advanced technologies in the field of substrate patterning.
Collaborations
Throughout his career, Juergen has collaborated with esteemed colleagues, including James K Gimzewski and Pierre L Guéret. These collaborations have contributed to the advancement of innovative technologies in their respective fields.
Conclusion
Juergen P Brugger's contributions to substrate patterning technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the development of micro-scale devices and technologies.