Trumpington, United Kingdom

Mark E Welland


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 102(Granted Patents)


Location History:

  • Cambridge, GB (1998)
  • Trumpington, GB (2001)

Company Filing History:


Years Active: 1998-2001

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2 patents (USPTO):Explore Patents

Title: Mark E Welland: Innovator in Substrate Patterning Technology

Introduction

Mark E Welland is a distinguished inventor based in Trumpington, GB. He has made significant contributions to the field of substrate patterning, holding two patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is an "Apparatus and method for defining a pattern on a substrate." This invention provides an apparatus and a method for defining a pattern on a substrate using a shadow masking technique. The apparatus comprises a flexible member with a movable portion and at least one aperture. This flexible member is positioned above the substrate, acting as a shadow mask. The apparatus also includes a support for the substrate, distance-controlling means for managing the distance between the movable portion and the substrate, and an actuator for moving the flexible member and substrate relative to each other. Additionally, it features an emission source that emits materials, electrons, or light, aiming through the shadow mask at the substrate to define the pattern. Such patterns can be utilized in micromechanic, microoptic, or microelectronic devices. The described apparatus may be implemented using the AFM principle.

Career Highlights

Mark E Welland is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop advanced technologies in substrate patterning.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues, including James K Gimzewski and Rato R Schlittler. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Mark E Welland is a prominent figure in the field of substrate patterning technology, with a focus on innovative methods and apparatuses. His contributions continue to influence advancements in micromechanic, microoptic, and microelectronic devices.

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